Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

In the present dissertation the surface reactivity of small molecules within the thin film growth by chemical vapor deposition and area-selective atomic layer deposition is studied by density functional theory. In a first part, an approach for an automated exploration of reaction networks is prese...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Pieck, Fabian
Beteiligte:	Tonner-Zech, Ralf (Prof. Dr.) (BetreuerIn (Doktorarbeit))
Format:	Dissertation
Sprache:	Englisch
Veröffentlicht:	Philipps-Universität Marburg 2022
Schlagworte:	Atomic Layer Deposition (ALD) Density Functional Theory (DFT) Chemie Area Selective Atomic Layer Deposition (AS-A Metalorganic Vapor Phase Epitaxy (MOVPE) Chemistry & allied sciences
Online-Zugang:	PDF-Volltext
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