Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

In the present dissertation the surface reactivity of small molecules within the thin film growth by chemical vapor deposition and area-selective atomic layer deposition is studied by density functional theory. In a first part, an approach for an automated exploration of reaction networks is prese...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Autor principal: Pieck, Fabian
Outros Autores: Tonner-Zech, Ralf (Prof. Dr.) (BetreuerIn (Doktorarbeit))
Formato: Dissertation
Idioma:inglês
Publicado em: Philipps-Universität Marburg 2022
Assuntos:
Metalorganic Vapor Phase Epitaxy (MOVPE)
Atomic Layer Deposition (ALD)
Chemie
Density Functional Theory (DFT)
Area Selective Atomic Layer Deposition (AS-A
Chemistry & allied sciences
Acesso em linha:Texto integral em PDF
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!

Internet

Texto integral em PDF

Detalhes do Exemplar
Área/Cota: urn:nbn:de:hebis:04-z2023-00863
Publikationsdatum: 2023-03-09
Datum der Annahme: 2022-10-20
Downloads: 101 (2024), 86 (2023)
Lizenz: https://creativecommons.org/licenses/by-nc-sa/4.0
Zugangs-URL: https://archiv.ub.uni-marburg.de/diss/z2023/0086
https://doi.org/10.17192/z2023.0086

Registos relacionados