Chemical vapor deposition and physical characterization of gallium, and carbon-related structures on Si (001) and GaP/Si (001) templates for the growth of graphene layers

Chemical vapor deposition and physical characterization of gallium, and carbon-related structures on Si (001) and GaP/Si (001) templates for the growth of graphene layers

This study aimed at the deposition of graphene on Si(001) via CVD by depositing Ga on Si, which was then treated with C. Ga has been shown to have a catalytic effect on the growth of graphene. This study focussed on examining the growth surface and the deposition of Ga on this. Si(001) was primarily...

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Príomhchruthaitheoir: Werner, Katharina
Rannpháirtithe: Stolz, Wolfgang (Dr. habil.) (Comhairleoir tráchtais)
Formáid: Dissertation
Teanga:Béarla
Foilsithe / Cruthaithe: Philipps-Universität Marburg 2015
Ábhair:
Silizium
Semiconducting silicon
Metallic gallium
Chemische Gasphasenabscheidung
Physik
Graphen
Gallium
Graphene
Chemical vapour deposition
Physics
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Sonraí sealbhúcháin ó
Gairmuimhir: urn:nbn:de:hebis:04-z2015-04724
Dáta a fhoilsithe: 2015-11-30
Datum der Annahme: 2015-09-30
Downloads: 93 (2024), 99 (2023), 55 (2022), 58 (2021), 50 (2020), 38 (2019), 35 (2018)
Lizenz: https://rightsstatements.org/vocab/InC-NC/1.0/
URL Rochtana: https://archiv.ub.uni-marburg.de/diss/z2015/0472
https://doi.org/10.17192/z2015.0472

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