Chemical vapor deposition and physical characterization of gallium, and carbon-related structures on Si (001) and GaP/Si (001) templates for the growth of graphene layers

Chemical vapor deposition and physical characterization of gallium, and carbon-related structures on Si (001) and GaP/Si (001) templates for the growth of graphene layers

This study aimed at the deposition of graphene on Si(001) via CVD by depositing Ga on Si, which was then treated with C. Ga has been shown to have a catalytic effect on the growth of graphene. This study focussed on examining the growth surface and the deposition of Ga on this. Si(001) was primarily...

Descripción completa

Guardado en:
Detalles Bibliográficos
Autor principal: Werner, Katharina
Otros Autores: Stolz, Wolfgang (Dr. habil.) (Orientador)
Formato: Dissertation
Lenguaje:inglés
Publicado: Philipps-Universität Marburg 2015
Materias:
Silizium
Semiconducting silicon
Metallic gallium
Chemische Gasphasenabscheidung
Physik
Graphen
Gallium
Graphene
Chemical vapour deposition
Physics
Acceso en línea:Texto Completo PDF
Etiquetas: Agregar Etiqueta
Sin Etiquetas, Sea el primero en etiquetar este registro!

Internet

Texto Completo PDF

Detalle de Existencias desde
Número de Clasificación: urn:nbn:de:hebis:04-z2015-04724
Fecha de Publicación: 2015-11-30
Datum der Annahme: 2015-09-30
Downloads: 93 (2024), 99 (2023), 55 (2022), 58 (2021), 50 (2020), 38 (2019), 35 (2018)
Lizenz: https://rightsstatements.org/vocab/InC-NC/1.0/
URL de Acceso: https://archiv.ub.uni-marburg.de/diss/z2015/0472
https://doi.org/10.17192/z2015.0472

Ejemplares similares