Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

In the present dissertation the surface reactivity of small molecules within the thin film growth by chemical vapor deposition and area-selective atomic layer deposition is studied by density functional theory. In a first part, an approach for an automated exploration of reaction networks is prese...

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Bibliographic Details
Main Author: Pieck, Fabian
Contributors: Tonner-Zech, Ralf (Prof. Dr.) (Thesis advisor)
Format: Doctoral Thesis
Published: Philipps-Universität Marburg 2022
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Call Number: urn:nbn:de:hebis:04-z2023-00863
Publication Date: 2023-03-09
Date of Acceptance: 2022-10-20
Downloads: 112 (2024), 86 (2023)
License: https://creativecommons.org/licenses/by-nc-sa/4.0
Access URL: https://archiv.ub.uni-marburg.de/diss/z2023/0086