Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

In the present dissertation the surface reactivity of small molecules within the thin film growth by chemical vapor deposition and area-selective atomic layer deposition is studied by density functional theory. In a first part, an approach for an automated exploration of reaction networks is prese...

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Bibliographic Details

Main Author:	Pieck, Fabian
Contributors:	Tonner-Zech, Ralf (Prof. Dr.) (Thesis advisor)
Format:	Doctoral Thesis
Language:	English
Published:	Philipps-Universität Marburg 2022
Subjects:	Metalorganic Vapor Phase Epitaxy (MOVPE) Chemie Atomic Layer Deposition (ALD) Density Functional Theory (DFT) Area Selective Atomic Layer Deposition (AS-A Chemistry & allied sciences
Online Access:	PDF Full Text
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