On the mechanisms of hydrogen implantation induced silicon surface layer cleavage

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Bibliographic Details
Main Author: Höchbauer, Tobias
Format: Doctoral Thesis
Language:English
Published: Philipps-Universität Marburg 2001
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Call Number: urn:nbn:de:hebis:04-z2002-04033
Publication Date: 2003-08-06
Date of Acceptance: 2001-12-18
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License: https://rightsstatements.org/vocab/InC-NC/1.0/
Access URL: https://archiv.ub.uni-marburg.de/diss/z2002/0403
https://doi.org/10.17192/z2002.0403