Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

In the present dissertation the surface reactivity of small molecules within the thin film growth by chemical vapor deposition and area-selective atomic layer deposition is studied by density functional theory. In a first part, an approach for an automated exploration of reaction networks is prese...

Szczegółowa specyfikacja

Zapisane w:
Opis bibliograficzny
1. autor: Pieck, Fabian
Kolejni autorzy: Tonner-Zech, Ralf (Prof. Dr.) (Promotor doktoranta)
Format: Dissertation
Język:angielski
Wydane: Philipps-Universität Marburg 2022
Hasła przedmiotowe:
Metalorganic Vapor Phase Epitaxy (MOVPE)
Atomic Layer Deposition (ALD)
Chemie
Density Functional Theory (DFT)
Area Selective Atomic Layer Deposition (AS-A
Chemistry & allied sciences
Dostęp online:PDF pełnotekstowe
Etykiety: Dodaj etykietę
Nie ma etykietki, Dołącz pierwszą etykiete!
No references were found for this record.

Podobne zapisy