Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

In the present dissertation the surface reactivity of small molecules within the thin film growth by chemical vapor deposition and area-selective atomic layer deposition is studied by density functional theory. In a first part, an approach for an automated exploration of reaction networks is prese...

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Bibliografische gegevens
Hoofdauteur: Pieck, Fabian
Andere auteurs: Tonner-Zech, Ralf (Prof. Dr.) (Thesis begeleider)
Formaat: Dissertation
Taal:Engels
Gepubliceerd in: Philipps-Universität Marburg 2022
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