Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

Ab Initio Modelling of Chemical Vapor and Area‐Selective Atomic Layer Deposition - Developing an Automated Exploration of Surface Reaction Networks

In the present dissertation the surface reactivity of small molecules within the thin film growth by chemical vapor deposition and area-selective atomic layer deposition is studied by density functional theory. In a first part, an approach for an automated exploration of reaction networks is prese...

Täydet tiedot

Tallennettuna:
Bibliografiset tiedot
Päätekijä: Pieck, Fabian
Muut tekijät: Tonner-Zech, Ralf (Prof. Dr.) (BetreuerIn (Doktorarbeit))
Aineistotyyppi: Dissertation
Kieli:englanti
Julkaistu: Philipps-Universität Marburg 2022
Aiheet:
Metalorganic Vapor Phase Epitaxy (MOVPE)
Atomic Layer Deposition (ALD)
Chemie
Density Functional Theory (DFT)
Area Selective Atomic Layer Deposition (AS-A
Chemistry & allied sciences
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