On the mechanisms of hydrogen implantation induced silicon surface layer cleavage

On the mechanisms of hydrogen implantation induced silicon surface layer cleavage

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Kaituhi matua: Höchbauer, Tobias
Hōputu: Dissertation
Reo:Ingarihi
I whakaputaina: Philipps-Universität Marburg 2001
Ngā marau:
Chemie
Silicon surface layer cleavage
Chemistry & allied sciences
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Tau karanga: urn:nbn:de:hebis:04-z2002-04033
Rā whakaputa: 2003-08-06
Datum der Annahme: 2001-12-18
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Lizenz: https://rightsstatements.org/vocab/InC-NC/1.0/
Zugangs-URL: https://archiv.ub.uni-marburg.de/diss/z2002/0403
https://doi.org/10.17192/z2002.0403

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