Dokument
| Titel: | Investigation of light-induced defects in hydrogenated amorphous silicon by low temperature annealing and pulsed degradation |
| Autor: | Heck, Stephan |
| Veröffentlicht: | 2002 |
| URI: | https://archiv.ub.uni-marburg.de/diss/z2002/0408 |
| DOI: | https://doi.org/10.17192/z2002.0408 |
| URN: | urn:nbn:de:hebis:04-z2002-04083 |
| DDC: | 530 Physik |
| Titel (trans.): | Investigation of light-induced defects in hydrogenated amorphous silicon by low temperature annealing and pulsed degradation |
| Publikationsdatum: | 2003-08-06 |
| Lizenz: | https://rightsstatements.org/vocab/InC-NC/1.0/ |
| Schlagwörter: |
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| Hydrogenated amorphous silicon |
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